LAPSE:2023.4628
Published Article
LAPSE:2023.4628
A Mini Review on Thin Film Superconductors
David Sibanda, Sunday Temitope Oyinbo, Tien-Chien Jen, Ayotunde Idris Ibitoye
February 23, 2023
Thin superconducting films have been a significant part of superconductivity research for more than six decades. They have had a significant impact on the existing consensus on the microscopic and macroscopic nature of the superconducting state. Thin-film superconductors have properties that are very different and superior to bulk material. Amongst the various classification criteria, thin-film superconductors can be classified into Fe based thin-film superconductors, layered titanium compound thin-film superconductors, intercalation compounds of layered and cage-like structures, and other thin-film superconductors that do not fall into these groups. There are various techniques of manufacturing thin films, which include atomic layer deposition (ALD), chemical vapour deposition (CVD), physical vapour deposition (PVD), molecular beam epitaxy (MBE), sputtering, electron beam evaporation, laser ablation, cathodic arc, and pulsed laser deposition (PLD). Thin film technology offers a lucrative scheme of creating engineered surfaces and opens a wide exploration of prospects to modify material properties for specific applications, such as those that depend on surfaces. This review paper reports on the different types and groups of superconductors, fabrication of thin-film superconductors by MBE, PLD, and ALD, their applications, and various challenges faced by superconductor technologies. Amongst all the thin film manufacturing techniques, more focus is put on the fabrication of thin film superconductors by atomic layer deposition because of the growing popularity the process has gained in the past decade.
Keywords
atomic layer deposition, Meissner effect, pulsed laser deposition, thin film superconductors, thin-film technology
Subject
Suggested Citation
Sibanda D, Oyinbo ST, Jen TC, Ibitoye AI. A Mini Review on Thin Film Superconductors. (2023). LAPSE:2023.4628
Author Affiliations
Sibanda D: Department of Mechanical Engineering Science, University of Johannesburg, Johannesburg 2006, South Africa
Oyinbo ST: Department of Mechanical Engineering Science, University of Johannesburg, Johannesburg 2006, South Africa [ORCID]
Jen TC: Department of Mechanical Engineering Science, University of Johannesburg, Johannesburg 2006, South Africa [ORCID]
Ibitoye AI: Department of Mechanical Engineering Science, University of Johannesburg, Johannesburg 2006, South Africa
Journal Name
Processes
Volume
10
Issue
6
First Page
1184
Year
2022
Publication Date
2022-06-14
Published Version
ISSN
2227-9717
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Original Submission
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PII: pr10061184, Publication Type: Review
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LAPSE:2023.4628
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doi:10.3390/pr10061184
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Feb 23, 2023
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CC BY 4.0
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