The microwave plasma torch (MPT) has gained popularity in industrial applications due to its high energy density, ionization levels, and high temperature. However, the non-uniform and unstable plasma generated by microwave plasma sources has limited the production of large-scale MPTs. This paper proposes a novel MPT device utilizing a four-port microwave source (2.45 GHz, 4 kW) to address these issues. The improved plasma uniformity and stability are achieved through the new structure, and the microwave efficiency is enhanced by introducing the focusing dielectric in the coupled cavity. Using a 3D electromagnetic field model, microwave plasma model and fluid model, the paper optimizes the geometry and inlet mode of the MPT device. Experimental results show that the novel MPT device can generate a plasma torch with a maximum height of 545 mm, a working range of 10−95 L/min, and a microwave efficiency up to 86%. The proposed device not only competently meets industrial requirements, but also provides design ideas and methods for future MPT devices.