LAPSE:2023.3161v1
Published Article

LAPSE:2023.3161v1
Optimal Magnetic Graphite Heater Design for Impurity Control in Single-Crystal Si Grower Using Crystal Growth Simulation
February 22, 2023
Abstract
In this paper, we report a successfully modified single-crystal Si growth furnace for impurity control. Four types of arbitrary magnetic heater (AMGH) systems with 3, 4, 5, and poly parts were designed in a coil shape and analyzed using crystal growth simulation. The concentration of oxygen impurities in single-crystal Si ingots was compared among the designed AMGHs and a normal graphite heater (NGH). The designed AMGHs were confirmed to be able to control turbulence and convection in a molten state, which created a vortex that influenced the oxygen direction near the melt−crystal interface. It was confirmed that replacing NGH with AMGHs resulted in a reduction in the average oxygen concentration at the Si melt−crystal interface by approximately 4.8%.
In this paper, we report a successfully modified single-crystal Si growth furnace for impurity control. Four types of arbitrary magnetic heater (AMGH) systems with 3, 4, 5, and poly parts were designed in a coil shape and analyzed using crystal growth simulation. The concentration of oxygen impurities in single-crystal Si ingots was compared among the designed AMGHs and a normal graphite heater (NGH). The designed AMGHs were confirmed to be able to control turbulence and convection in a molten state, which created a vortex that influenced the oxygen direction near the melt−crystal interface. It was confirmed that replacing NGH with AMGHs resulted in a reduction in the average oxygen concentration at the Si melt−crystal interface by approximately 4.8%.
Record ID
Keywords
arbitrary magnetic device, crystal growth furnace, crystal growth simulation, graphite heater, impurity, single crystal silicon
Subject
Suggested Citation
Jeon HJ, Park H, Alhammadi S, Jung JH, Kim WK. Optimal Magnetic Graphite Heater Design for Impurity Control in Single-Crystal Si Grower Using Crystal Growth Simulation. (2023). LAPSE:2023.3161v1
Author Affiliations
Jeon HJ: School of Chemical Engineering, Yeungnam University, Gyeongsan 38541, Korea; R&D Team, S-TECH Co., Ltd., Daegu 42921, Korea [ORCID]
Park H: School of Chemical Engineering, Yeungnam University, Gyeongsan 38541, Korea
Alhammadi S: School of Chemical Engineering, Yeungnam University, Gyeongsan 38541, Korea
Jung JH: School of Chemical Engineering, Yeungnam University, Gyeongsan 38541, Korea
Kim WK: School of Chemical Engineering, Yeungnam University, Gyeongsan 38541, Korea
Park H: School of Chemical Engineering, Yeungnam University, Gyeongsan 38541, Korea
Alhammadi S: School of Chemical Engineering, Yeungnam University, Gyeongsan 38541, Korea
Jung JH: School of Chemical Engineering, Yeungnam University, Gyeongsan 38541, Korea
Kim WK: School of Chemical Engineering, Yeungnam University, Gyeongsan 38541, Korea
Journal Name
Processes
Volume
10
Issue
1
First Page
70
Year
2021
Publication Date
2021-12-30
ISSN
2227-9717
Version Comments
Original Submission
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PII: pr10010070, Publication Type: Journal Article
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LAPSE:2023.3161v1
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https://doi.org/10.3390/pr10010070
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Feb 22, 2023
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