LAPSE:2023.24050
Published Article

LAPSE:2023.24050
Electro-Thermal Simulation of Vertical VO2 Thermal-Electronic Circuit Elements
March 27, 2023
Abstract
Advancement of classical silicon-based circuit technology is approaching maturity and saturation. The worldwide research is now focusing wide range of potential technologies for the “More than Moore” era. One of these technologies is thermal-electronic logic circuits based on the semiconductor-to-metal phase transition of vanadium dioxide, a possible future logic circuits to replace the conventional circuits. In thermal-electronic circuits, information flows in a combination of thermal and electronic signals. Design of these circuits will be possible once appropriate device models become available. Characteristics of vanadium dioxide are under research by preparing structures in laboratory and their validation by simulation models. Modeling and simulation of these devices is challenging due to several nonlinearities, discussed in this article. Introduction of custom finite volumes method simulator has however improved handling of special properties of vanadium dioxide. This paper presents modeling and electro-thermal simulation of vertically structured devices of different dimensions, 10 nm to 300 nm layer thicknesses and 200 nm to 30 μm radii. Results of this research will facilitate determination of sample sizes in the next phase of device modeling.
Advancement of classical silicon-based circuit technology is approaching maturity and saturation. The worldwide research is now focusing wide range of potential technologies for the “More than Moore” era. One of these technologies is thermal-electronic logic circuits based on the semiconductor-to-metal phase transition of vanadium dioxide, a possible future logic circuits to replace the conventional circuits. In thermal-electronic circuits, information flows in a combination of thermal and electronic signals. Design of these circuits will be possible once appropriate device models become available. Characteristics of vanadium dioxide are under research by preparing structures in laboratory and their validation by simulation models. Modeling and simulation of these devices is challenging due to several nonlinearities, discussed in this article. Introduction of custom finite volumes method simulator has however improved handling of special properties of vanadium dioxide. This paper presents modeling and electro-thermal simulation of vertically structured devices of different dimensions, 10 nm to 300 nm layer thicknesses and 200 nm to 30 μm radii. Results of this research will facilitate determination of sample sizes in the next phase of device modeling.
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Keywords
beyond CMOS, electro-thermal simulation, thermal-electronic circuits, vertical structure, VO2
Subject
Suggested Citation
Darwish M, Neumann P, Mizsei J, Pohl L. Electro-Thermal Simulation of Vertical VO2 Thermal-Electronic Circuit Elements. (2023). LAPSE:2023.24050
Author Affiliations
Darwish M: Department of Electron Devices, Budapest University of Technology and Economics, 1117 Budapest, Hungary [ORCID]
Neumann P: Department of Electron Devices, Budapest University of Technology and Economics, 1117 Budapest, Hungary [ORCID]
Mizsei J: Department of Electron Devices, Budapest University of Technology and Economics, 1117 Budapest, Hungary [ORCID]
Pohl L: Department of Electron Devices, Budapest University of Technology and Economics, 1117 Budapest, Hungary [ORCID]
Neumann P: Department of Electron Devices, Budapest University of Technology and Economics, 1117 Budapest, Hungary [ORCID]
Mizsei J: Department of Electron Devices, Budapest University of Technology and Economics, 1117 Budapest, Hungary [ORCID]
Pohl L: Department of Electron Devices, Budapest University of Technology and Economics, 1117 Budapest, Hungary [ORCID]
Journal Name
Energies
Volume
13
Issue
13
Article Number
E3447
Year
2020
Publication Date
2020-07-03
ISSN
1996-1073
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Original Submission
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PII: en13133447, Publication Type: Journal Article
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LAPSE:2023.24050
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https://doi.org/10.3390/en13133447
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Mar 27, 2023
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