LAPSE:2019.0642
Published Article
LAPSE:2019.0642
Development of a Microwave Irradiation Probe for a Cylindrical Applicator
July 25, 2019
A microwave irradiation probe was newly developed for downsizing microwave applicators and the overall microwave heating apparatus. The key component of the proposed probe is a tapered section composed of polytetrafluoroethylene (PTFE) and alumina. Insertion of the tapered section between the input port and the applicator vessel realizes impedance matching to the microwave power source and reduces the reflected power from the applicator. The proposed microwave probe for a cylindrical applicator was designed using 3D electromagnetic simulations. The permittivity data of two liquid samples—ultrapure water and 2 M NaOH solution—were measured and taken into simulations. The conductivity of the NaOH solution was estimated from the measurement results. The measured reflection ratio of the fabricated applicator was in good accordance with the simulated one. The frequency ranges in which the measured reflection ratio was less than 10% were from 1.45 GHz to 2.7 GHz when using water and from 1.6 GHz to 2.7 GHz when using the NaOH solution as the sample. The heating rate of the applicator was roughly estimated as 63 to 69 K for a 5 min interval during the 2.45 GHz microwave irradiation at the input power of 100 W.
Record ID
Keywords
applicator design, coaxial feeding, electromagnetic simulation, microwave heating
Subject
Suggested Citation
Mitani T, Nakajima R, Shinohara N, Nozaki Y, Chikata T, Watanabe T. Development of a Microwave Irradiation Probe for a Cylindrical Applicator. (2019). LAPSE:2019.0642
Author Affiliations
Mitani T: Research Institute for Sustainable Humanosphere, Kyoto University, Kyoto 611-0011, Japan [ORCID]
Nakajima R: Research Institute for Sustainable Humanosphere, Kyoto University, Kyoto 611-0011, Japan
Shinohara N: Research Institute for Sustainable Humanosphere, Kyoto University, Kyoto 611-0011, Japan
Nozaki Y: Japan Chemical Engineering & Machinery Co. Ltd., Osaka 532-0031, Japan
Chikata T: Japan Chemical Engineering & Machinery Co. Ltd., Osaka 532-0031, Japan
Watanabe T: Research Institute for Sustainable Humanosphere, Kyoto University, Kyoto 611-0011, Japan
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Nakajima R: Research Institute for Sustainable Humanosphere, Kyoto University, Kyoto 611-0011, Japan
Shinohara N: Research Institute for Sustainable Humanosphere, Kyoto University, Kyoto 611-0011, Japan
Nozaki Y: Japan Chemical Engineering & Machinery Co. Ltd., Osaka 532-0031, Japan
Chikata T: Japan Chemical Engineering & Machinery Co. Ltd., Osaka 532-0031, Japan
Watanabe T: Research Institute for Sustainable Humanosphere, Kyoto University, Kyoto 611-0011, Japan
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Journal Name
Processes
Volume
7
Issue
3
Article Number
E143
Year
2019
Publication Date
2019-03-07
Published Version
ISSN
2227-9717
Version Comments
Original Submission
Other Meta
PII: pr7030143, Publication Type: Journal Article
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Published Article
LAPSE:2019.0642
This Record
External Link
doi:10.3390/pr7030143
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Version History
[v1] (Original Submission)
Jul 25, 2019
Verified by curator on
Jul 25, 2019
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v1
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https://psecommunity.org/LAPSE:2019.0642
Original Submitter
Calvin Tsay
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