LAPSE:2023.4682
Published Article
LAPSE:2023.4682
Chemical Vapor Deposition of Longitudinal Homogeneous Parylene Thin-Films inside Narrow Tubes
David Redka, Milan Buttberg, Gerhard Franz
February 23, 2023
The effect of quasi-exponentially decreasing film thicknesses of thin poly-para-xylylene (PPX-N) coatings inside narrow tubes or micro scaled gaps is well known and has been discussed by many authors since the late 1970s. However, for technical applications it is often necessary to provide a longitudinal homogeneous film thickness to ensure the constant properties that are required. In a previous work, it was shown, in principle and for the first time, that a temperature gradient along the tube will effectively counteract the longitudinal decreasing film thickness of the PPX-N coating of the interior wall of a capillary. Therefore, this effect is discussed in theory and the provided model is verified by experiments. Our prediction of a required sticking coefficient curve yields experimentally measured homogeneous film thicknesses and shows a good agreement with the given prognosis. Further, it is shown in theory that there is a maximum achievable homogeneous film thickness in the tube in comparison to a blank surface, which can be understood as a coating efficiency for this type of deposition.
Keywords
chemical vapor deposition, constant film thickness, deposition model, parylene, sticking coefficient, temperature gradient
Subject
Suggested Citation
Redka D, Buttberg M, Franz G. Chemical Vapor Deposition of Longitudinal Homogeneous Parylene Thin-Films inside Narrow Tubes. (2023). LAPSE:2023.4682
Author Affiliations
Redka D: Department of Applied Sciences and Mechatronics, Munich University of Applied Sciences HM, Lothstr. 34, 80335 Munich, Germany [ORCID]
Buttberg M: Department of Applied Sciences and Mechatronics, Munich University of Applied Sciences HM, Lothstr. 34, 80335 Munich, Germany
Franz G: Department of Applied Sciences and Mechatronics, Munich University of Applied Sciences HM, Lothstr. 34, 80335 Munich, Germany [ORCID]
Journal Name
Processes
Volume
10
Issue
10
First Page
1982
Year
2022
Publication Date
2022-10-01
Published Version
ISSN
2227-9717
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Original Submission
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PII: pr10101982, Publication Type: Journal Article
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doi:10.3390/pr10101982
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Feb 23, 2023
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