LAPSE:2023.14931
Published Article
LAPSE:2023.14931
An Improved Hidden Markov Model for Monitoring the Process with Autocorrelated Observations
Yaping Li, Haiyan Li, Zhen Chen, Ying Zhu
March 2, 2023
Abstract
With the development of intelligent manufacturing, automated data acquisition techniques are widely used. The autocorrelations between data that are collected from production processes have become more common. Residual charts are a good approach to monitoring the process with data autocorrelation. An improved hidden Markov model (IHMM) for the prediction of autocorrelated observations and a new expectation maximization (EM) algorithm is proposed. A residual chart based on IHMM is employed to monitor the autocorrelated process. The numerical experiment shows that, in general, IHMMs outperform both conventional hidden Markov models (HMMs) and autoregressive (AR) models in quality shift diagnosis, decreasing the cost of missing alarms. Moreover, the times taken by IHMMs for training and prediction are found to be much less than those of HMMs.
Keywords
autocorrelation, hidden Markov model (HMM), residual chart
Suggested Citation
Li Y, Li H, Chen Z, Zhu Y. An Improved Hidden Markov Model for Monitoring the Process with Autocorrelated Observations. (2023). LAPSE:2023.14931
Author Affiliations
Li Y: College of Economics and Management, Nanjing Forestry University, Nanjing 210037, China
Li H: College of Economics and Management, Nanjing Forestry University, Nanjing 210037, China
Chen Z: Department of Industrial Engineering & Management, Shanghai Jiao Tong University, Shanghai 200240, China
Zhu Y: Department of Industrial Engineering & Management, Shanghai Jiao Tong University, Shanghai 200240, China
Journal Name
Energies
Volume
15
Issue
5
First Page
1685
Year
2022
Publication Date
2022-02-24
ISSN
1996-1073
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Original Submission
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PII: en15051685, Publication Type: Journal Article
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LAPSE:2023.14931
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https://doi.org/10.3390/en15051685
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