LAPSE:2023.36910
Published Article
LAPSE:2023.36910
Colloidal TiO2 Nanorod Films Deposited Using the MAPLE Technique: Role of the Organic Capping and Absence of Characteristic Surface Patterns
November 30, 2023
Thin films of titanium dioxide (TiO2) nanocrystals, widely acknowledged for their unique physical-chemical properties and functionalities, are used in disparate technological fields, including photovoltaics, sensing, environmental remediation and energy storage. In this paper, the preparation of thin films consisting of anatase-phase TiO2 nanorods deposited using the matrix-assisted pulsed laser evaporation (MAPLE) technique and their characterization in terms of morphology, elemental composition and wettability are presented and discussed. Particular attention is paid to the effects of the laser fluence, varied over a broad range (F = 25, 50, 100 mJ/cm2), and to the role of the capping surfactants bound to the surface of the nanorod precursors. Whereas increasing fluence favored a partial removal of the surface-bound surfactants, a post-growth UV-light-driven photocatalytic treatment of the films was found to be necessary to reduce the incorporated fraction of organics to a further substantial extent. It was noteworthy that, under our experimental conditions, the distinctive surface patterns and roughness that commonly degrade the morphology of films deposited using the MAPLE technique were not observable. This previously unreported experimental evidence was rationalized on the basis of the interaction dynamics between solvent/solute droplets ejected from the laser-irradiated target and the rough surfaces of the growing film.
Keywords
elemental/morphological analyses, laser fluence, MAPLE technique, missing MAPLE surface patterns, organic capping, photocatalytic degradation, thin films, TiO2 nanorods
Subject
Suggested Citation
Cesaria M, Taurino A, Cozzoli PD, Arima V, Caricato AP. Colloidal TiO2 Nanorod Films Deposited Using the MAPLE Technique: Role of the Organic Capping and Absence of Characteristic Surface Patterns. (2023). LAPSE:2023.36910
Author Affiliations
Cesaria M: Department of Mathematics and Physics “Ennio De Giorgi”, University of Salento, Via Arnesano, I-73100 Lecce, Italy [ORCID]
Taurino A: Institute for Microelectronics and Microsystems, IMM-CNR, Via Monteroni, I-73100 Lecce, Italy [ORCID]
Cozzoli PD: Department of Mathematics and Physics “Ennio De Giorgi”, University of Salento, Via Arnesano, I-73100 Lecce, Italy [ORCID]
Arima V: CNR NANOTEC Institute of Nanotechnology, c/o Campus Ecotekne, University of Salento, Via Monteroni, I-73100 Lecce, Italy [ORCID]
Caricato AP: Department of Mathematics and Physics “Ennio De Giorgi”, University of Salento, Via Arnesano, I-73100 Lecce, Italy [ORCID]
Journal Name
Processes
Volume
11
Issue
9
First Page
2591
Year
2023
Publication Date
2023-08-29
Published Version
ISSN
2227-9717
Version Comments
Original Submission
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PII: pr11092591, Publication Type: Journal Article
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LAPSE:2023.36910
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doi:10.3390/pr11092591
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Nov 30, 2023
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CC BY 4.0
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Nov 30, 2023
 
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Nov 30, 2023
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Original Submitter
Calvin Tsay
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